ELECTRON BEAM DEVICE AND METHOD OF MANUFACTURING DEVICE USING IT

摘要

PROBLEM TO BE SOLVED: To provide an electron beam device which can carry out evaluation of a test piece provided with a pattern in which a minimum linear width is 0.2μm and less at high through put and with high reliability by preventing deterioration in resolution due to Space Charge Effect and to provide a method of manufacturing the device using it. SOLUTION: The electron beam device carries out detection by having the test piece W irradiated by a rectangular shape primary beam and magnifying and projecting secondary electron emitted from the test piece W to a detecting surface by an optical system 5. The electronic optical system 5 is provided with an opening plate 18 with ring shaped openings 181 to 184 to deform the secondary electron into a hollow state beam. The width of the ring state opening is small enough to ignore spherical aberration. Furthermore, the electronic optical system 5 is preferably provided with a compensating lens 22 to compensate axial chromatic aberration in the secondary electron. COPYRIGHT: (C)2007,JPO&INPIT