发明名称 Silicon-doped carbon dielectrics
摘要 A silicone-doped carbon interlayer dielectric (ILD) and its method of formation are disclosed. The ILD's dielectric constant and/or its mechanical strength can be tailored by varying the ratio of carbon-to-silicon in the silicon-doped carbon matrix.
申请公布号 US2006226516(A1) 申请公布日期 2006.10.12
申请号 US20050105036 申请日期 2005.04.12
申请人 INTEL CORPORATION 发明人 GOODNER MICHAEL D.;ANTONELLI GEORGE A.
分类号 H01L23/58;H01L21/469 主分类号 H01L23/58
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