| 发明名称 |
Polymeric inhibitors for enhanced planarization |
| 摘要 |
The invention provides a chemical-mechanical polishing system comprising a polishing component, a surfactant, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the polishing system.
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| 申请公布号 |
US2006226126(A1) |
申请公布日期 |
2006.10.12 |
| 申请号 |
US20050093806 |
申请日期 |
2005.03.30 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
ZHOU RENJIE;GRUMBINE STEVEN K.;ZHANG JIAN;CHERIAN ISAAC K. |
| 分类号 |
C03C15/00;B44C1/22;C23F1/00;H01L21/461 |
主分类号 |
C03C15/00 |
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