| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a water treating device for a substrate which generates no variance in quality of the substrate by increasing efficiency of photosensitive reaction. <P>SOLUTION: A treatment section 9a provided to the water treating device has a frame-shaped primary body 11, and cone nozzles 13a, 13b, 13c, and 13d are provided to an upper frame of the primary body 11. Straight nozzles 15a, 15b, 15c, and 15d are provided to a lower frame of the primary body 11. When a water treatment is carried out, the top surface of the substrate 71, i.e. a surface coated with a photosensitive layer 19 is water-treated by the cone nozzles 13a, 13b, 13c, and 13d. The reverse surface of the substrate 17, i.e. a surface which is not coated with the photosensitive layer 19, on the other hand, is water-treated by the straight nozzles 15a, 15b, 15, and 15d. Further, injection ranges of the cone nozzles 13a, 13b, 13c, and 13d overlap with one another. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
