发明名称 EVALUATION METHOD OF CONTAMINATION STATE OF SUBSTRATE-MANUFACTURING LOCAL SPACE
摘要 PROBLEM TO BE SOLVED: To provide a method for evaluating accurately the contamination state of a local space passed by a substrate at the substrate manufacturing time. SOLUTION: This evaluation method of the contamination state of the local space in a substrate manufacturing process has characteristics, wherein in the substrate manufacturing process, a passive sampler is put into the local space passed by the substrate, and contaminants in the space are collected into an adsorbent in the passive sampler, and then the adsorbed contaminant is eliminated from the adsorbent, and the eliminated contaminant is analyzed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006275551(A) 申请公布日期 2006.10.12
申请号 JP20050090812 申请日期 2005.03.28
申请人 SUMIKA CHEMICAL ANALYSIS SERVICE LTD 发明人 TAIRA TOSHIKAZU;FUJII HIROSHI;SAKAMOTO YASUKO;SAKAKIBARA TAKAAKI;HASEGAWA MIKIO
分类号 G01N30/00;B01J20/281;G01N1/22;G01N30/72;G01N30/88 主分类号 G01N30/00
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