PRODUCTION METHOD OF SILICON OXIDE FILM

摘要

PROBLEM TO BE SOLVED: To provide a novel production method of a silicon oxide film relating to a method of forming a coating film on the surface of a substrate in order to impart characteristics, such as wear resistance, thereto.

SOLUTION: In the production method of the silicon oxide film, the air bubbles B produced within liquid L including a silicone compound and generated by plasma are brought into contact with the surface of the substrate S to deposit the silicon oxide film on the surface of the substrate S. According to the production method of the silicon oxide film, the silicon oxide film can be deposited on the surface of the substrate S in the liquid L by using the silicone compound in a liquid state as a raw material.

COPYRIGHT: (C)2007,JPO&INPIT