发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND APPARATUS FOR PLATING SEMICONDUCTOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which enhances connection reliability by increasing adhesion between a metal film containing nickel and another metal film formed on the surface of the metal film, and an apparatus for plating a semiconductor substrate. SOLUTION: A method of manufacturing the semiconductor device comprises a step of forming a metal film containing nickel on a semiconductor substrate by using an electroplating method, and a step of washing away the metal film with a hydrochloric acid solution or a sulfuric acid solution. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006279034(A) 申请公布日期 2006.10.12
申请号 JP20060056440 申请日期 2006.03.02
申请人 NEC ELECTRONICS CORP 发明人 TACHIBANA HIROAKI
分类号 H01L21/288;C25D5/48;C25D7/12;H01L21/3205 主分类号 H01L21/288
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