发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a substrate processor for further improving throughput of the substrate process which is conducted by soaking the substrate into a processing liquid stored in a processing tank. SOLUTION: In the liquid exchanging process for exchanging the processing liquid stored in the processing tank 10 to the sulfuric acid from the pure water and adjusting the liquid temperature of the sulfuric acid after exchange to the predetermined temperature; the pure water is exhausted first from the processing tank 10 and an external tank 20. The sulfuric acid is supplied toward the external tank 20 from a supply nozzle 40. Next, the upper circulating process is executed by operating a pump 53 and a temperature adjusting unit 63, then opening the valves 56a, 67, and 66a, and closing the valves 56b, 57, and 66b. Subsequently, the internal circulating process is executed when the liquid temperature of the processing tank 10 becomes higher than the predetermined value by maintaining the pump 53 and temperature adjusting unit 63 to the operating condition, opening the valves 56a, 67, and 66b, and closing the valves 56a, 57, and 66b. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006278628(A) 申请公布日期 2006.10.12
申请号 JP20050094287 申请日期 2005.03.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NAGARA SHUJI
分类号 H01L21/304 主分类号 H01L21/304
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