发明名称 Quantum dot vertical cavity surface emitting laser and fabrication method of the same
摘要 A quantum dot vertical capacity surface emitting laser (QD-VCSEL) and a method of manufacturing the same are provided. The QD-VCSEL includes a substrate, a lower distributed brag reflector (DBR) mirror formed on the substrate, an electron transport layer (ETL) formed on the lower DBR mirror, an emitting layer (EML) formed of nano-particle type group II-VI compound semiconductor quantum dots on the ETL, a hole transport layer (HTL) formed on the EML, and an upper DBR mirror formed on the HTL.
申请公布号 US2006227837(A1) 申请公布日期 2006.10.12
申请号 US20050285176 申请日期 2005.11.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE EUN-KYUNG;CHOI BYOUNG-IYONG
分类号 H01S5/00;B82Y20/00 主分类号 H01S5/00
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