发明名称 Vertikaler Leistungs-MOSFET mit dicker Metallschicht zur Verminderung des verteilten Widerstandes und Verfahren zur Herstellung
摘要 The on-resistance of a vertical power transistor is substantially reduced by forming a thick metal layer on top of the relatively thin metal layer that is conventionally used to make contact with the individual transistor cells in the device. The thick metal layer is preferably plated electrolessly on the thin metal layer through an opening that is formed in the passivation layer. <IMAGE>
申请公布号 DE69534838(T2) 申请公布日期 2006.10.12
申请号 DE1995634838T 申请日期 1995.12.29
申请人 SILICONIX INC. 发明人 WILLIAMS, RICHARD K.
分类号 H01L21/60;H01L29/417;H01L21/288;H01L21/336;H01L23/482;H01L23/485;H01L27/04;H01L29/739;H01L29/78 主分类号 H01L21/60
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