PLASMA PROCESSING METHOD AND SYSTEM

摘要

Plasma processing method and system which can monitor an ion current incident to the surface of a sample accurately. A vacuum container (1) is evacuated through an outlet (11) by means of a turbo-molecular pump (3) while introducing predetermined gas from a gas supply unit (2), and a predetermined pressure level is sustained in the vacuum container (1) by means of a pressure regulating valve (4). Induction coupling plasma is generated in the vacuum container (1) by supplying a high frequency power from a high frequency power supply (5) for plasma source to a coil (8) provided in the vicinity of a dielectric window (7). A high frequency power supply (10) for sample electrode for supplying a high frequency power to a sample electrode (6) is provided, and a matching circuit (13) for sample electrode and a high frequency sensor (14) are provided between the high frequency power supply (10) for sample electrode and the sample electrode (6). An ion current incident to the surface of a sample can thereby be monitored accurately using the high frequency sensor (14) and a arithmetic unit (15).