| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device which has good startability by improving ignitability of plasma. <P>SOLUTION: The plasma processing device comprises: a reactor 3 which is held by a reactor supporter 2 via a holding jig 1; an ignition electrode 4 which is arranged in a position where the ignition electrode 4 is held by the holding jig 1 of the reactor 3; and plasma generation electrodes 6 for supplying electric power to a discharge space 5 in the reactor 3. The plasma P is ignited by generating sparks S between the ignition electrode 4 and the plasma generation electrodes 6 so as to ignite the discharge space 5, and the electric power is supplied by the plasma generation electrodes 6 to the discharge space 5 where the plasma P is ignited. Thereby the plasma processing device generates the plasma P continuously in the discharge space 5. A potential difference reduction prevention means 7 for preventing reduction in potential difference between the plasma generation electrodes 6 and the ignition electrode 4 is installed in the holding jig 1. <P>COPYRIGHT: (C)2007,JPO&INPIT |
