发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR INGOT
摘要 PROBLEM TO BE SOLVED: To propose a method for manufacturing a semiconductor ingot which is small in variation of specific resistance, uniform in quality and excellent in characteristics. SOLUTION: In the method for manufacturing the semiconductor ingot by solidifying a semiconductor melt 9 containing a first dopant material regulating a first conduction type in the prescribed direction within a casting mold, the liquid surface of the semiconductor melt 9 in the solidification process is measured and the semiconductor raw material having the first dopant concentration lower than that of the semiconductor melt is supplied into the semiconductor melt according to the measured value. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006273669(A) 申请公布日期 2006.10.12
申请号 JP20050096343 申请日期 2005.03.29
申请人 KYOCERA CORP 发明人 NIWA TETSUO
分类号 C01B33/02 主分类号 C01B33/02
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