METHOD OF TREATING THIN LAYER AND METHOD OF MANUFACTURING NON-VOLATILE MEMORY CELL USING THE SAME
摘要
<p>In a method of forming a thin-film structure employed in a non-volatile semiconductor device, an oxide film is formed on a substrate. An upper nitride film is formed on the oxide film by nitrifying an upper portion of the oxide film through a plasma nitration process. A lower nitride film is formed between the substrate and the oxide film by nitrifying a lower portion of the oxide film through a thermal nitration process. A damage to the thin-film structure generated in the plasma nitration process may be at least partially cured in the thermal nitration process, and/or may be cured in a post-thermal treatment process.</p>
申请公布号
KR20060106255(A)
申请公布日期
2006.10.12
申请号
KR20050028800
申请日期
2005.04.07
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, CHUL SUNG;SHIN, YU GYUN;KOO, BON YOUNG;KIM, JI HYUN;NOH, YOUNG JIN