| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device for treating a gas by using a filler, for instance, a gas treatment device for detoxifying a waste gas containing injurious substances such as various kinds of special material gases of silane, phosphine, hydrogen chloride, dichlorosilane, ammonia, or the like, used in a semiconductor manufacture process and a liquid crystal display element manufacture process, or the like, by a detoxifying agent. <P>SOLUTION: A flow path 6 where a gas flows is formed inside a main body 1 and a support plate 4 for supporting the detoxifying agent for detoxifying the waste gas is provided on the downstream side of the flow path 6. The shape of the support plate 4 is formed such that it is convexed to the upstream side as approaching a center axis direction from the vicinity of the wall surface of the flow path 6, and a detoxifying agent layer 3 wherein the detoxifying agent is laminated is provided so that the surface on the upstream side is vertical to the center axis of the flow path 6 on the support plate 4. The detoxifying agent layer 3 is thicker in an area near the wall surface than in the part of the center axis of the flow path 6, the drift of the gas is reduced in the area, and the early breakthrough of the detoxifying agent is prevented by increasing a use amount of the detoxifying agent. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
