发明名称 |
RESIN LAYER CURING APPARATUS AND RESIN LAYER CURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a resin layer curing apparatus capable of correcting a substrate along with cooling at the time of curing of a resin layer to prevent the occurrence of warpage, and a resin layer curing method. SOLUTION: The resin layer curing apparatus is equipped with a turntable 1 on which substrates P1 and P2 for a disk are placed, a lamination part 2 for laminating the superposed substrates P1 and P2 and an ultraviolet irradiation part 3 for emitting ultraviolet rays. The ultraviolet irradiation part 3 has a light source 31 for irradiating the disk D after lamination with ultraviolet rays U. A cooling gas blowing part 32 constituted of a transparent material pervious to ultraviolet rays U is arranged between the light source 31 and a susceptor 4 on which the disc D is placed. The cooling gas blowing part 32 is connected to a gas supply device 41, which supplies a cooling gas G, through a gas introducing part 32b and a large number of blowing holes 32a are formed to the bottom part of the cooling gas blowing part 32. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006272662(A) |
申请公布日期 |
2006.10.12 |
申请号 |
JP20050092953 |
申请日期 |
2005.03.28 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
ITO TOMOKAZU;NISHIGAKI HISASHI;TANABE SHOHEI |
分类号 |
B29C35/08;B05C9/08;B05D3/04;B29C39/22;B29C65/02;B29L9/00;B29L17/00;G11B7/26 |
主分类号 |
B29C35/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|