| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing exposure in a short period of time by reflecting UV rays on a UV ray reflector. <P>SOLUTION: A lamp 9a includes a light source 21a and includes a cold filter 23 above the light source 21a. The lamp also includes reflector plates 25a, 25b around the light source 21a, with heat exhaust ports 27a, 27b between the cold filter 23 and the reflector plates 25a, 25b, and with a heat exhaust port 29 between the reflector plates 25a, 25b. The lamp 9a is installed inside the exposure apparatus. By providing the lamp 9a with the reflector plates 25a, 25b, UV rays 39a, 39e with which the side face or lower face of the the light source 21a is irradiated are guided to irradiate the upper face of the light source 21a, which increases a dose of UV rays irradiating the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
