发明名称 EXPOSURE TABLE AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure table which can suitably hold by suction even a thin substrate and can hold a substrate even in a state where a substrate peripheral edge is waving, and is superior in maintenance operability for replacement etc of the table, by simple constitution even when a mount surface of the table for the substrate wears and so on due to the use of the table, and an exposure device which makes a series of operations smooth and improves the quality of the substrate. <P>SOLUTION: The exposure table 7 has a mount plate 8 for a substrate, a table main body 9 which supports the mount plate, a plurality of suction holes provided in the mount plate, and a communication path which is formed in the table main body and communicates with the suction openings. The suction holes include first suction holes 8a and second suction holes 8b which are formed as holes 8b1 smaller than the first suction holes, the suction holes are also arranged adjacent to one another to form suction hole groups disposed at predetermined positions at designated intervals along at least one of the longitudinal and lateral sides of the peripheral edges of the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006276084(A) 申请公布日期 2006.10.12
申请号 JP20050090361 申请日期 2005.03.28
申请人 ORC MFG CO LTD 发明人 ISE MASARU;MIZUGUCHI SHINICHIRO
分类号 G03F7/20;H01L21/027;H05K3/00 主分类号 G03F7/20
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