| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of peeling only chemical amplification type negative resist, without impairing the anti-refraction effects of an a-C:H film. <P>SOLUTION: A chemical amplified negative resist pattern formed on a surface of an amorphous carbon film is peeled by using an acid solution which will not substantially etch amorphous carbon. Alternatively, the chemical amplified negative resist pattern formed on the surface of the amorphous carbon film is peeled off, by using an alkali solution which will not substantially etch amorphous carbon. <P>COPYRIGHT: (C)2007,JPO&INPIT |
