| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive that can be preferably used in a purpose of use of polishing an object to be polished including germanium single crystal or silicon-germanium mixed single crystal, and to provide a polishing method using such an abrasive. <P>SOLUTION: An abrasive contains sodium hypochlorite, colloidal silica, and water. Effective chlorine concentration in the abrasive is 0.5 to 2.5%, and the content of the colloidal silica is 1 to 13 wt.% in the abrasive. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
