| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor for sufficiently preventing the processing failure of a substrate. SOLUTION: This substrate processor 500 is constituted of an indexer block 9, a reflection preventing film treatment block 10, a resist film treatment block 11, a resist cover film treatment block 12, a first interface block 13, an external device setting block 14, a second interface block 15, a cleaning/drying treatment block 16, a cover film removal block 17, a development treatment block 18, a first conveyance block 19, and a second conveyance block 20. An exposure device STP is arranged in the external device setting block 14. Predetermined processing is operated to the substrate prior to exposure treatment by an exposure device STP by the treatment blocks 10 to 12, and predetermined treatment is carried out to the substrate posterior to the exposure treatment by the treatment blocks 16 to 18. COPYRIGHT: (C)2007,JPO&INPIT
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