A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.
申请公布号
WO2006011105(A3)
申请公布日期
2006.10.12
申请号
WO2005IB52379
申请日期
2005.07.18
申请人
PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH;KONINKLIJKE PHILIPS ELECTRONICS N. V.;ZINK, PETER;DERRA, GUENTHER HANS