发明名称 ELECTROLYTIC COPPER FOIL AND PROCESS FOR PRODUCING ELECTROLYTIC COPPER FOIL, SURFACE TREATED ELCTROLYTIC COPPER FOIL USING SAID ELECTROLYTIC COPPER FOIL, AND COPPER-CLAD LAMINATE PLATE AND PRINTED WIRING BOARD USING SAID SURFACE TREATED ELECTROLYTIC
摘要 <p>This invention provides an electrolytic copper foil, which, as compared with low-profile electrolytic copper foils which have been supplied into the market, has lower profile and is glossy. The electrolytic copper foil has an ultralow profile of less than 1.0 µm in terms of surface roughness (Rzjis) on the deposition face side independently of the thickness of the electrolytic copper foil, and, at the same time, the gloss [Gs(60º)] of the deposition face is not less than 400. This electrolytic copper foil can be produced, for example, by electrolysis using a sulfuric acid-type copper electrolysis solution prepared by adding 3-mercapto-1-propanesulfonic acid and/or bis(3-sulfopropyl)disulfide, a quaternary ammonium salt polymer having a cyclic structure, and chlorine.</p>
申请公布号 WO2006106956(A1) 申请公布日期 2006.10.12
申请号 WO2006JP306920 申请日期 2006.03.31
申请人 MITSUI MINING & SMELTING CO., LTD;MATSUDA, MITSUYOSHI;SAKAI, HISAO;TOMONAGA, SAKIKO;DOBASHI, MAKOTO 发明人 MATSUDA, MITSUYOSHI;SAKAI, HISAO;TOMONAGA, SAKIKO;DOBASHI, MAKOTO
分类号 C25D1/04;C25D1/00;H05K1/09 主分类号 C25D1/04
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