| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical element which is suitable for measurement by extreme ultraviolet rays where it is difficult to use a transmission type optical element, exposure equipment using the optical element, and a device manufacturing method using the exposure equipment. <P>SOLUTION: The exposure equipment projects a pattern of an original plate to a substrate by the extreme ultraviolet rays from a light source through an optical system. The optical elements are positioned on either the light source side of the original plate in the optical pass from the light source to the substrate or the substrate side of the original plate, and include a film through which the extreme ultraviolet rays are transmitted and a shading member which is located on the film and shades a part of the film. <P>COPYRIGHT: (C)2007,JPO&INPIT |
