发明名称 EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE-MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure method capable of preventing deterioration in exposure accuracy, due to bubbles inside a liquid. <P>SOLUTION: This method has a first process of supplying a second liquid different in at least either of specific gravity and temperature from a first liquid into the first liquid in a second space K2, or a second process of discharging the second liquid from the second space K2. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006278796(A) 申请公布日期 2006.10.12
申请号 JP20050096607 申请日期 2005.03.30
申请人 NIKON CORP 发明人 OKADA HISAYA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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