发明名称 APPARATUS AND METHOD FOR MANUFACTURING THIN FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus capable of improving the productivity of thin film manufacturing. <P>SOLUTION: The thin film manufacturing apparatus is provided with a first matching unit 13, a first feeding transmission line 12, a discharge electrode 3, and a counter electrode 2. The first matching unit 13 capable of matching the impedance of the output side transmits fed first power. The first feeding transmission line 12 connecting its one end to the first matching unit 13 mediates the feeding of the first power. The discharge electrode 3 is connected to the other end of the first feeding transmission line 12 to receive the first power. The counter electrode 2 is opposed to the discharge electrode 3. The characteristic impedance of the first feeding transmission line 12 is 20 to 30Ω. The first feeding transmission line 13 is provided with a first heat medium feeding pipe 20 for passing a heat medium, and the discharge electrode 3 is provided with a heat medium circulating pipe 25 for circulating the heat medium. The first matching unit 13 is provided with a first heat medium feeding part 17 for feeding the first heat medium to the first heat medium feeding pipe 20. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006278777(A) 申请公布日期 2006.10.12
申请号 JP20050096296 申请日期 2005.03.29
申请人 MITSUBISHI HEAVY IND LTD 发明人 KAWAMURA KEISUKE;MASHIMA HIROSHI;TAKEUCHI YOSHIAKI;TAGASHIRA KENJI;SAKAKI MASAHIRO
分类号 H01L21/205;H01L31/04 主分类号 H01L21/205
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