| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus of forming a different species lamination thin film in which production efficiency is high and which can be reduced in a cost. SOLUTION: (1) A metal material gas for film formation by atomic layer deposition is supplied to a reaction vessel, (2) then, the metal material gas in the reaction vessel is exhausted, (3) an oxidant material gas for the film formation by the ALD is supplied to the reaction vessel, (4) then, the oxidant materials gas in the reaction vessel is exhausted, and the metal oxide thin film of one atomic layer is formed at one cycle of these procedures. These procedures are repeated at a plurality of cycle times, and the metal oxide thin film of multiple atom layers is formed for this. Subsequently, the oxidant material gas in the process of the above (3) is changed to a nitriding agent material gas. By identical reaction vessel, the cycle is newly repeated and the lamination of a metal nitride thin film is carried out on the metal oxide film. COPYRIGHT: (C)2007,JPO&INPIT
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