| 发明名称 |
MULTI-LAYER SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY |
| 摘要 |
<p>A multi-layered spectral purity filter improves the spectral purity of an Extreme UltraViolet (EUV) radiation beam and also collects debris emitted from a radiation source.</p> |
| 申请公布号 |
KR20060105484(A) |
申请公布日期 |
2006.10.11 |
| 申请号 |
KR20060027855 |
申请日期 |
2006.03.28 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE VADIM YEVGENYEVICH;MOORS JOHANNES HUBERTUS JOSEPHINA;SJMAENOK LEONID AIZIKOVITCH;SALASHCHENKO NIKOLAY NIKOLAEVITCH |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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