发明名称 |
Apparatus, method and system for fabricating a patterned media imprint master |
摘要 |
<p>An apparatus, system, and method are disclosed for fabricating a patterned media imprint master. A substrate and a deposition mask may be fixably attached by an intervening spacing element, such that the substrate and deposition mask act as a unified element during a deposition process. A deposition mask may include a plurality of apertures generated by a conventional lithographic process. Material may be deposited onto the substrate through the deposition mask from more than one deposition source oriented at a unique deposition angle. A resulting substrate deposition pattern thus exhibits a density greater than a deposition mask aperture density while avoiding deposition pattern distortion.</p> |
申请公布号 |
EP1710789(A2) |
申请公布日期 |
2006.10.11 |
申请号 |
EP20060004945 |
申请日期 |
2006.03.10 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES B. V. |
发明人 |
ALBRECHT, THOMAS R.;YANG, HENRY H. |
分类号 |
G11B5/86;G11B7/26 |
主分类号 |
G11B5/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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