PHOTO-MASK, METHOD OF MANUFACTURING THE SAME AND BLANK MASK USED TO THE SAME METHOD

摘要

A photomask, a manufacturing method thereof, and a blank mask used therefor are provided to improve uniformity of thickness of a remaining photoresist layer by using a light transmissivity controlling region instead of a fine pattern. A photomask includes a transparent substrate(20), a light transmissivity controlling layer(22) on the transparent substrate, and a light shielding layer(24) on the light transmissivity controlling layer. A first hole(h1) for exposing partially the transparent substrate to the outside is formed through the stacked structure of the light transmissivity controlling layer and the light shielding layer. A second hole(h2) for exposing partially the light transmissivity controlling layer to the outside is formed through the light shielding layer.