Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

摘要

Sulfonate salts have the formula:
CF 3 -CH(OCOR)-CF 2 SO 3 - M + wherein R is C 1 -C 20 alkyl or C 6 -C 14 aryl, and M + is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.