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发明名称
METHOD OF CHECKING LAYOUT IN PHOTOLITHOGRAPHY PROCESS USING ANISOTROPY AND ASYMMETRIC ILLUMINATION
摘要
申请公布号
KR20060105847(A)
申请公布日期
2006.10.11
申请号
KR20050028284
申请日期
2005.04.04
申请人
HYNIX SEMICONDUCTOR INC.
发明人
OH, SE YOUNG
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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智能主机（DR2031）
