发明名称 PLASMA PROCESSING APPARATUS
摘要 A plasma processing apparatus is provided to improve cooling efficiency by using a zigzag type connection structure between circulation lines. A plasma processing apparatus is used for generating predetermined plasma in a vacuum state chamber. The plasma processing apparatus includes a lower electrode and a cooling plate. The lower electrode is installed in a lower portion of the chamber. The lower electrode is used for loading a substrate. The cooling plate(140) is under the lower electrode, so that the cooling plate contacts a lower region of the lower electrode in order to cool the lower electrode. The cooling plate includes an inlet port, an outlet port, a plurality of circulation lines(142) parallel with each other, and a plurality of connection members for connecting the circulation lines with each other and forming the circulating line structure like a zigzag type structure.
申请公布号 KR100635223(B1) 申请公布日期 2006.10.11
申请号 KR20050038550 申请日期 2005.05.09
申请人 ADP ENGINEERING CO., LTD. 发明人 LEE, YOUNG JONG;CHOI, JUN YOUNG;SON, SUK MIN;HEO, JIN PIL;HAN, MYUNG WOO
分类号 H01L21/02 主分类号 H01L21/02
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