发明名称 |
PLASMA PROCESSING APPARATUS |
摘要 |
A plasma processing apparatus is provided to improve cooling efficiency by using a zigzag type connection structure between circulation lines. A plasma processing apparatus is used for generating predetermined plasma in a vacuum state chamber. The plasma processing apparatus includes a lower electrode and a cooling plate. The lower electrode is installed in a lower portion of the chamber. The lower electrode is used for loading a substrate. The cooling plate(140) is under the lower electrode, so that the cooling plate contacts a lower region of the lower electrode in order to cool the lower electrode. The cooling plate includes an inlet port, an outlet port, a plurality of circulation lines(142) parallel with each other, and a plurality of connection members for connecting the circulation lines with each other and forming the circulating line structure like a zigzag type structure.
|
申请公布号 |
KR100635223(B1) |
申请公布日期 |
2006.10.11 |
申请号 |
KR20050038550 |
申请日期 |
2005.05.09 |
申请人 |
ADP ENGINEERING CO., LTD. |
发明人 |
LEE, YOUNG JONG;CHOI, JUN YOUNG;SON, SUK MIN;HEO, JIN PIL;HAN, MYUNG WOO |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|