发明名称 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method
摘要 A stage alignment apparatus includes a first moving member which moves in a first direction, a second moving member which moves in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second moving member and is guided in the first and second directions, a first control section which controls a posture of the first moving member in a third direction, the third direction being a direction rotatable about an axis substantially perpendicular to the first and second directions, and a second control section which controls a posture of the second moving member in the third direction on the basis of a signal which controls the posture of the first moving member in the third direction.
申请公布号 US7119879(B2) 申请公布日期 2006.10.10
申请号 US20050188620 申请日期 2005.07.26
申请人 CANON KABUSHIKI KAISHA 发明人 MORISADA MASAHIRO
分类号 G03B27/42;B23Q5/28;G03B27/58;G03F7/20;G03F9/00;G05B11/00;H01L21/00;H01L21/027;H01L21/68;H02K41/00 主分类号 G03B27/42
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