发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.
|
申请公布号 |
US7119885(B2) |
申请公布日期 |
2006.10.10 |
申请号 |
US20040926402 |
申请日期 |
2004.08.26 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OTTENS JOOST JEROEN;VAN EMPEL TJARKO ADRIAAN RUDOLF;VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES;MIEDEMA JAN REIN;ZAAL KOEN JACOBUS JOHANNES MARIA |
分类号 |
G03B27/62;G03B27/58;G03F7/20;H01L21/027;H01L21/683 |
主分类号 |
G03B27/62 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|