REMOVAL OF MATERIAL BY RADIATION APPLIED AT AN OBLIQUE ANGLE

摘要

An apparatus (10) and method for removing undesired material from the surfac e of a substrate (12) provides a flow (18) of inert gas over the undesired material substrate surface while irradiating (11) the undesired material with energetic photons directed at an angle (8) that is oblique to the substrate (12). The invention enables removal of undesired material without altering the physical properties of the material underlying or adjacent the removed, undesired material. In certain circumstances, the non-perpendicular incidence permits effective removal where normal incidence caused damage to the substrate or poor remova l or both.