发明名称 |
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers |
摘要 |
A composition including supercritical fluid and at least one additive selected from fluoro species, and primary and/or secondary amines, optionally with co-solvent, low k material attack-inhibitor(s) and/or surfactant(s). The composition has particular utility for cleaning of semiconductor wafers to remove post-ashing residues therefrom.
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申请公布号 |
US7119052(B2) |
申请公布日期 |
2006.10.10 |
申请号 |
US20030602172 |
申请日期 |
2003.06.24 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
KORZENSKI MICHAEL B.;XU CHONGYING;BAUM THOMAS H.;MINSEK DAVID;GHENCIU ELIODOR G. |
分类号 |
B01D11/00;C11D7/26;C11D7/28;C11D7/32;C11D7/50;C11D11/00;G03F7/42;H01L21/306;H01L21/311 |
主分类号 |
B01D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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