发明名称 System and method of manufacturing a substrate device
摘要 The invention provides a substrate device having thin film transistors (TFTs), each including a semiconductor layer and capacitors formed above the TFTs, that are provided on a substrate. Each of the capacitors can include a first electrode electrically connected to a part of the semiconductor layer, a second electrode arranged to face the first electrode, and a dielectric film including a nitride film arranged between the first electrode and the second electrode on the substrate. Further, the nitride film has an aperture facing the semiconductor layer as seen in plan view. Accordingly, it is possible to effectively hydrogenate the semiconductor layer using the aperture.
申请公布号 US7119391(B2) 申请公布日期 2006.10.10
申请号 US20030633682 申请日期 2003.08.05
申请人 SEIKO EPSON CORPORATION 发明人 IKI TAKUNORI;HAYASHI TOMOHIKO
分类号 G02F1/1368;H01L21/00;G02F1/136;H01L21/336;H01L21/77;H01L27/12;H01L27/13;H01L27/146;H01L29/786 主分类号 G02F1/1368
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