发明名称 Passage structures for use in low-voltage applications
摘要 Enhanced passgate structures for use in low-voltage systems are presented in which the influence of V<SUB>t </SUB>on the range of signals passed by single-transistor passgates is reduced. In one arrangement, the V<SUB>GATE</SUB>-V<SUB>t </SUB>limit for signals propagated through NMOS passgates is raised by applying a higher V<SUB>GATE</SUB>; in another arrangement, the V<SUB>t </SUB>is lowered. The use of CMOS passgates in applications where single-transistor passgates have traditionally been used is also presented.
申请公布号 US7119574(B1) 申请公布日期 2006.10.10
申请号 US20030637258 申请日期 2003.08.08
申请人 ALTERA CORPORATION 发明人 LEE ANDY L;CHANG WANLI;MCCLINTOCK CAMERON;TURNER JOHN E;JOHNSON BRIAN D;HWANG CHIAO KAI;CHANG RICHARD Y;CLIFF RICHARD G
分类号 H03K19/177;H03K17/06 主分类号 H03K19/177
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