发明名称 |
LITHOGRAPHIC APPARATUS, IMMERSION PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.</p> |
申请公布号 |
KR20060104924(A) |
申请公布日期 |
2006.10.09 |
申请号 |
KR20060027860 |
申请日期 |
2006.03.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER TOORN JAN GERARD CORNELIS;BUTLER HANS;COX HENRIKUS HERMAN MARIE;DRAAIJER EVERT HENDRIK JAN;TEN KATE NICOLAAS;VAN DER MEULEN FRITS;FRENCKEN MARK JOHANNES HERMANUS;HOUKES MARTIJN;ARENDS ANTONIUS HENRICUS;CUPERUS MINNE |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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