METHOD FOR MANUFACTURING ISOLATION LAYER IN SEMICONDUCTOR DEVICE,申请号KR20050026137-传众专利搜索

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发明名称	METHOD FOR MANUFACTURING ISOLATION LAYER IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20060104199(A)	申请公布日期	2006.10.09
申请号	KR20050026137	申请日期	2005.03.29
申请人	MAGNACHIP SEMICONDUCTOR, LTD.	发明人	PARK, MOON KI
分类号	H01L21/76;H01L21/762	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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