| 发明名称 |
Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method, and device manufactured thereby |
| 摘要 |
<p>A multi-layered spectral purity filter improves the spectral purity of an Extreme UltraViolet (EUV) radiation beam and also collects debris emitted from a radiation source.</p> |
| 申请公布号 |
EP1708031(A2) |
申请公布日期 |
2006.10.04 |
| 申请号 |
EP20060251514 |
申请日期 |
2006.03.22 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
BANINE, VADIM YEVGENYEVICH;MOORS, JOHANNES HUBERTUS JOSEPHINA;SJMAENOK, LEONID AIZIKOVITCH;SALASHCHENKO, NIKOLAY NIKOLAEVITCH |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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