| 摘要 |
A packaging laminate ( 10 ) including a substrate film ( 15 ) coated with a carbon containing silicon oxide layer ( 16, 17 ) on both surfaces is disclosed herein. A method for producing the laminate ( 10 ), and blanks and packages fabricated from the laminate are also disclosed herein. The PECVD process of the present invention strains the substrate film ( 15 ) during deposition thereby creating a very thin oxide layer with superior durability, oxygen and aroma barrier properties. The carbon-containing silicon oxide coating ( 16, 17 ) has a stoichiometry of SiOxCy in which x is witin the range of 1.5-2.2 and y is within the range of 0.15-0.80. The substrate film ( 15 ) may include a core layer ( 12 ) of a material selected from the group consisting of paper, paperboard, a foamed core, polyethylene terephtalate, polyamide, polyethylene and polypropylene.
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