发明名称 Structure to achieve high-Q and low insertion loss film bulk acoustic resonators
摘要 A film bulk acoustic resonator is formed on a substrate. The film bulk acoustic resonator includes a layer of piezoelectric material having a first surface proximate the substrate, and a second surface distal from the substrate. The first conductive layer deposited on the first surface of the piezoelectric material includes a first portion having a surface on a different plane than a surface associated with a second portion.
申请公布号 US7116034(B2) 申请公布日期 2006.10.03
申请号 US20050065511 申请日期 2005.02.23
申请人 INTEL CORPORATION 发明人 WANG LI-PENG;MA OING;RAO VALLURI
分类号 H01L41/08;H03H3/02;H03H9/02;H03H9/17 主分类号 H01L41/08
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