| 摘要 |
A system and method for use in a lithographic environment include an illumination system, an array of individually controllable elements, a projection system, and a substrate. The projection system comprises an array of lenses. The apparatus also includes a sensor system and a positioning system controllable to adjust a position and/or an orientation of at least one of the array of elements; a component of the projection system; and the illumination system. The apparatus also includes a control system which controls the array of elements to pattern the beam, and which also receives the intensity signal and controls the positioning system according to the detected intensity distribution to adjust the projected radiation pattern.
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