| 摘要 |
A TFT array substrate used for a display device and a method of making the same are disclosed. A optically transparent thick resin insulation film 5 is formed on a base substrate and an upper contact hole 51 is perforated through the optically transparent thick resin insulation film 5 . A lower contact hole 41 perforated through a gate insulation film 15 and patterning of an ITO film to make a transparent pixel electrode are then collectively carried out under a photoresist pattern 8 . Where the photoresist pattern 8 is provided after making the ITO film, an aperture 81 is perforated closer to the center of the upper contact hole 51 at an end portion of a connecting line 14 a for a pad and is smaller in diameter by a side etching size plus a margin than the upper contact hole. Subsequently, following three-etching steps are carried out: (1) patterning of the ITO film along the photoresist pattern 8 , (2) the lower contact hole 41 is made by using buffered hydrofluoric acid solution, and (3) an "eaves" portion 6 a of the ITO films is removed.
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