发明名称 |
Pulsed excitation of inductively coupled plasma sources |
摘要 |
The reaction rate of a feed gas flowed into a plasma chamber is controlled. In one embodiment a pulsed power supply repeatedly applies a high power pulse to the plasma chamber to increase the reaction rate of plasma within the chamber, and applies a low power pulse between applications of the high power pulses.
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申请公布号 |
US7115185(B1) |
申请公布日期 |
2006.10.03 |
申请号 |
US20030663104 |
申请日期 |
2003.09.16 |
申请人 |
ADVANCED ENERGY INDUSTRIES, INC. |
发明人 |
GONZALEZ JUAN JOSE;TOMASEL FERNANDO GUSTAVO;SHABALIN ANDREW |
分类号 |
C23F1/02;C23C16/00;H01J;H01J7/24 |
主分类号 |
C23F1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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