| 发明名称 |
Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system |
| 摘要 |
A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
|
| 申请公布号 |
US7116394(B2) |
申请公布日期 |
2006.10.03 |
| 申请号 |
US20030738976 |
申请日期 |
2003.12.19 |
| 申请人 |
CARL ZEISS SMT AG |
发明人 |
BAKKER LEVINUS PIETER;KURT RALPH;MERTENS BASTIAAN MATTHIAS;WEISS MARKUS;TRENKLER JOHANN;SINGER WOLFGANG |
| 分类号 |
G03B27/52;G03F7/30;B08B6/00;B08B7/00;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
