发明名称 Method of fabrication of non-volatile memory
摘要 A non-volatile memory, which comprises an insulating substrate ( 11 ) that has a first electrode ( 18 ) that extends through the substrate from the front surface to the rear surface thereof; a second electrode ( 13 ) that is formed on one side of the insulating substrate ( 11 ); and a recording layer ( 12 ) that is clamped between the first electrode ( 18 ) and the second electrode ( 13 ) and whose resistance value varies when an electric pulse is applied across the first electrode ( 18 ) and the second electrode ( 13 ); wherein the insulating substrate ( 11 ) has a layered structure composed of an organic dielectric thin film ( 112 ) and an inorganic dielectric layer ( 111 ) that is thinner than the organic dielectric thin film ( 112 ); with the recording layer ( 12 ) being formed on the side on which the inorganic dielectric layer is formed. Use of this non-volatile memory increases the possible number of data writing cycles while saving power.
申请公布号 US7115473(B2) 申请公布日期 2006.10.03
申请号 US20050038034 申请日期 2005.01.21
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TANAKA HIDEYUKI;MORIMOTO KIYOSHI
分类号 H01L21/336;G11B9/00;G11B9/04;G11C11/22;G11C16/02;H01L27/10;H01L27/24;H01L45/00 主分类号 H01L21/336
代理机构 代理人
主权项
地址