发明名称 Lithographic apparatus and device manufacturing method
摘要 A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
申请公布号 US7116398(B2) 申请公布日期 2006.10.03
申请号 US20040972784 申请日期 2004.10.26
申请人 ASML NETHERLANDS B.V. 发明人 HOEFNAGELS JOHAN CHRISTIAAN GERARD;SPIT PETER
分类号 G02F1/13;G03B27/68;G02F1/1333;G02F1/1335;G03B27/32;G03B27/42;G03C5/00;G03F7/20;G03F9/00;G09F9/00;G09F9/30;H01J37/08;H01L21/027 主分类号 G02F1/13
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