发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
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申请公布号 |
US7116398(B2) |
申请公布日期 |
2006.10.03 |
申请号 |
US20040972784 |
申请日期 |
2004.10.26 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOEFNAGELS JOHAN CHRISTIAAN GERARD;SPIT PETER |
分类号 |
G02F1/13;G03B27/68;G02F1/1333;G02F1/1335;G03B27/32;G03B27/42;G03C5/00;G03F7/20;G03F9/00;G09F9/00;G09F9/30;H01J37/08;H01L21/027 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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